Access Fees

Facility access fees

The Quantum-Nano Fabrication and Characterization Facility (QNFCF) operates on a Core Research Facility model where our members can access shared equipment and are invoiced lab fees to partially defray the lab's cost of operations. ÌýThe following fees are charged for accessing the QNFCF.

  1. Onboarding fee: ÌýNew registrants wishing to access the QNC cleanroom will be charged a one time registration fee of $200.
  2. Equipment use fees: ÌýEquipment use (as measured by NEMO enable time) generates an equipment use fee as outlined in the table below.
  3. Per-enable fee: ÌýA "per-enable" fee of $1.84 for academic member ($5.52 for industrial members) is levied at every new tool enable in NEMO. ÌýThis is intended to defray the cost of consumables such as gloves, cleanroom suits and cleanroom wipes.
  4. Training fees: ÌýAll training in the QNFCF is staff led and generates a surcharge above the normal equipment use fee. ÌýThis surcharge is $25/hour for academic members and $75/hour for industrial members. ÌýThis fee is intended to partially defray the cost of staff labour.
  5. Staff support fees: ÌýWhen a QNFCF staff member is performing work on behalf of a researcher this generates a surcharge above the normal equipment use fee. ÌýThis surcharge is $50/hour for academic members and $150/hour for industrial members. ÌýThis fee is intended to completely defray the cost of staff labour.
  6. Inventory fees:Ìý The QNFCF maintains a stock of commonly used items and other material that areÌýnot economically feasible for individual members to purchase from suppliers themselves. ÌýA partial list of these items is below with prices listed in NEMO. ÌýPricesÌýchange regularly with inflation and exchange rate variations. ÌýThe QNFCF endeavours to provide these items to all members on a cost neutral basis.

Equipment use fees table

³¢´Ç³¦²¹³Ù¾±´Ç²ÔÌý Tool Type NEMO Tool Name

Academic Rate

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QNC cleanroom Lithography - Jeol 100kV E-beam Litho JEOL-EBL Ìý$120 Ìý$360
QNC cleanroom Lithography - Raith 150TWO 30kV E-beam Litho RAITH-EBL Ìý$60 Ìý$180
QNC cleanroom Lithography - Suss MA6 front/back UV aligner SUSS-align Ìý$35 Ìý$105
QNC cleanroom Lithography - Suss SB6 GEN2Ìý wafer bonder SUSS-bond Ìý$35 Ìý$105
QNC cleanroom Lithography - Heidelberg front/back maskless UV HEIDELBERG-MLA Ìý$40 Ìý$120
QNC cleanroom Lithography - HMDS oven YES-HMDS Ìý$25 Ìý$75
QNC cleanroom Lithography - UV semi-auto spin/bake BREWER-UVspinbake Ìý$30 Ìý$90
QNC cleanroom Lithography - E-beam semi-auto spin/bake BREWER-Ebeamspinbake Ìý$35 Ìý$105
QNC cleanroom Lithography - PR spin/bake station REYNOLDSTECH-twincoater Ìý$25 Ìý$75
QNC cleanroom Lithography - atmospheric oven FISHER-oven Ìý$15 Ìý$45
QNC cleanroom Deposition - E-beam evaporator ANGSTROM-Ebeam Ìý$35 Ìý$105
QNC cleanroom Deposition - E-beam evaporator INTLVAC-Ebeam Ìý$35 Ìý$105
QNC cleanroom Deposition - Thermal evaporator for Au/Be films ANGSTROM-thermal Ìý$35 Ìý$105
QNC cleanroom Deposition - ALD & PECVD cluster tool OXFORD-cluster Ìý$50 Ìý$150
QNC cleanroom Deposition - PVD for Nb superconducting films PLASSYS-sputter Ìý$40 Ìý$120
QNC cleanroom Deposition - PVD for Al superconducting films PLASSYS-Ebeam Ìý$40 Ìý$120
QNC cleanroom Deposition - oxidation/anneal furnace TYSTAR1-atm Ìý$40 Ìý$120
QNC cleanroom Deposition - LPCVD Nitride furnace TYSTAR2-nitride Ìý$45 Ìý$135
QNC cleanroom Deposition - LPCVD Poly Si furnace TYSTAR3-PolySiC Ìý$45 Ìý$135
QNC cleanroom Deposition - LPCVD LTO furnace TYSTAR4-LTO Ìý$45 Ìý$135
QNC cleanroom Deposition - Twin chamber sputter AJA-sputter Ìý$40 Ìý$120
QNC cleanroom Deposition - atmospheric RTA/RTP ALLWIN-RTP Ìý$40 Ìý$120
QNC cleanroom Deposition - atmospheric RTA/RTP ALLWIN-RTP2 Ìý$40 Ìý$120
QNC cleanroom Etch - ICPRIE Cl chemistries OXFORD-metalRIE Ìý$45 Ìý$135
QNC cleanroom Etch - ICPRIE F chemistries for deep Si etch OXFORD-SiRIE Ìý$45 Ìý$135
QNC cleanroom Etch - Oxygen plasma asher YES-ash Ìý$25 Ìý$75
QNC cleanroom Etch - Ion mill with SIMS endpoint detection AJA-ionmill Ìý$45 Ìý$135
QNC cleanroom Characterization - reflectometer FILMETRICS-F40 Ìý$10 Ìý$30
QNC cleanroom Characterization - reflectometer -auto FILMETRICS-F50 Ìý$10 Ìý$30
QNC cleanroom Characterization - semiconductor microscope OLYMPUS-scope1 Ìý$20 Ìý$60
QNC cleanroom Characterization - semiconductor microscope OLYMPUS-scope2 Ìý$20 Ìý$60
QNC cleanroom Characterization - stylus profilometer VEECO-profilometer Ìý$20 Ìý$60
QNC cleanroom Characterization - stylus profilometer BRUKER-profilometer Ìý$20 Ìý$60
QNC cleanroom Characterization - 4-point probe Rs mapper CDE-4pp Ìý$20 Ìý$60
QNC cleanroom Characterization - film stress measurement tool TOHO-stress Ìý$30 Ìý$90
QNC cleanroom Characterization - thin film ellipsometer WOOLLAM-ellip Ìý$40 Ìý$120
QNC cleanroom Characterization - electrical probe station SUSS-probe Ìý$15 Ìý$45
QNC cleanroom Characterization - electrical probe station EVERBEING-probe Ìý$15 Ìý$45
QNC cleanroom Characterization - SEM sample coater LEICA-coater Ìý$40 Ìý$120
QNC cleanroom Characterization - scanning electron microscope JEOL-SEM Ìý$45 Ìý$135
QNC cleanroom Characterization - atomic force microscope BRUKER-AFM Ìý$40 Ìý$120
QNC cleanroom Other - critical point dryer TOUSIMIS-CPD Ìý$30 Ìý$90
QNC cleanroom Wetbenches - for acids & bases (non HF) ACIDBASEnonHF Ìý$25 Ìý$75
QNC cleanroom Wetbenches - for HF acid solutions HFACID Ìý$25 Ìý$75
QNC cleanroom Wetbenches - solvents only SOLVENT1 Ìý$25 Ìý$75
QNC cleanroom Wetbenches - solvents only SOLVENT2 Ìý$25 Ìý$75
QNC cleanroom Wetbenches - for RCA clean solutions RCACLEAN Ìý$25 Ìý$75
QNC cleanroom Wetbenches - for KOH based bulk Si etch REYNOLDSTECH-bulkSi Ìý$12 Ìý$36
QNC cleanroom Wetbenches - for Piranha organic cleans PIRANHA Ìý$25 Ìý$75
QNC cleanroom Wetbenches - for UV develop processes DEVELOPUV Ìý$25 Ìý$75
QNC cleanroom Wetbenches - EBL develop processes DEVELOPEBL Ìý$25 Ìý$75
QNC 1706 Packaging LabÌý- LWD opt microscope OLYMPUS-scope3 Ìý$15 Ìý$45
QNC 1706 Packaging LabÌý- Dicing saw DISCO-saw Ìý$40 Ìý$120
QNC 1706 Packaging LabÌý- wirebond pull tester WESTBOND-pulltest Ìý$10 Ìý$30
QNC 1706 Packaging LabÌý- Manual wirebond WESTBOND-wirebond1 Ìý$40 Ìý$120
QNC 1706 Packaging LabÌý- Semi-auto wirebond WESTBOND-wirebond2 Ìý$40 Ìý$120
QNC 1706 Packaging LabÌý- Flip chip die bonder TRESKY-diebond Ìý$20 Ìý$60
QNC 1706 Packaging LabÌý- epoxy dispenser robot NORDSON-epoxy Ìý$15 Ìý$45
QNC 1706 Packaging LabÌý- H2 plasma cleaner LFC-plasmaclean Ìý$30 Ìý$90
QNC 1706 Packaging LabÌý- epoxy cure oven Cureoven Ìý$15 Ìý$45
QNC 1706 Packaging LabÌý-Ultron wafer cleaner Ìý Ìýno chargeÌý Ìýno chargeÌý
QNC 1508 Sample Prep LabÌý- Cont. ang. goniometer RAMEHART-contactangle Ìý$15 Ìý$45
QNC 1508 Sample Prep LabÌý- diamond scribe tool OEG-scriber Ìý$30 Ìý$90
QNC 1508 Sample Prep LabÌý- Solvents hood FUMEHOOD-north Ìý$10 Ìý$20
QNC 1508 Sample Prep LabÌý- Acids/Bases hood FUMEHOOD-south Ìý$10 Ìý$20
QNC B614 SW LabÌý- Beamer EBL software BEAMER Ìýno chargeÌý ÌýTBDÌý
QNC B614 SW LabÌý- Layout Editor SW LayoutEditor Ìýno chargeÌý ÌýTBDÌý
QNC B614 SW LabÌý- Ellipsometery SW CompleteEASE Ìýno chargeÌý ÌýTBDÌý
QNC B614 SW LabÌý- Raith GDSII editor RAITH-GDS Ìýno chargeÌý ÌýTBDÌý
QNC B709 QNC MetrologyÌý- JEOL F200 S/TEM w. EELS JEOL-TEM Ìý$75 Ìý$225
QNC B711 QNC Metrology - Zeiss Auriga SEM-FIB ZEISS-SEMFIB Ìý$100 Ìý$300
QNC B703 QNC TEM Sample PrepÌý- Polisher ALLIED-polish Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Microscope ZEISS-scope Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Multi-tool LEICA-EMTXP Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Dimpler SOUTHBAY-dimpler Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Saw SOUTHBAY-saw Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Ion mill LEICA-ionmill Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Disc cutter GATAN-cutter Ìý$20 Ìý$60
QNC B703 QNC TEM Sample PrepÌý- Polisher SOUTHBAY-polish Ìý$10 Ìý$30
QNC B706 Thin film ellipsometer WOOLLAM-ellip2 Ìý$40 Ìý$120
RAC1 1013 Crystal cutter (disc) ALLIED-xtal-cut-R1 Ìý$20 Ìý$60
RAC1 1013 Wire cutter WIRETEC-wire-saw-R1 Ìý$20 Ìý$20
RAC1 1013 Lapper Lapper-R1 Ìý$20 Ìý$60
RAC1 1013 Leitz microscope LEITZ-scope-R1 Ìý$20 Ìý$60
RAC1 1013 Evovision stereo microscope EVOVISION-scope-R1 Ìý$20 Ìý$60
RAC1 1013 PlasmaEtch reactive ion etcher PLASMAETCH-plasmaclean-R1 Ìý$15 Ìý$45
RAC1 1013 Manual wirebond WESTBOND-wirebond-R1 Ìý$40 Ìý$120
RAC1 1013 Rofin welder ROFIN-welder-R1 Ìý$25 Ìý$75
RAC1 1013 Wetbench for HF acid solutions WB-HFACID-R1 Ìý$25 Ìý$75
RAC1 1013 Wetbench - for acids & bases (non HF) WB-ACIDBASEnonHF-R1 Ìý$25 Ìý$75
RAC1 1013 Wetbench - for solvents only WB-SOLVENT-R1 Ìý$15 Ìý$45
RAC1 1013 TestEquity thermal chamber TESTEQUITY-Tchamber-R1 Ìý$2 Ìý$6
RAC1 1013 Assembly station 1 AssemblyStation1-R1 Ìý$1 Ìý$3
RAC1 1013 Assembly station 2 AssemblyStation2-R1 Ìý$1 Ìý$3
RAC1 2003 Mitutoyo microscope MITUTOYO-scope-R1 $20 Ìý$60
RAC1 2003 BRUKER optical profilometer BRUKER-contour-R1 Ìý$20 Ìý$60
RAC1 2003 Gloveboxed thermal evaporator Inert-AngstromEvap-R1 Ìý$35 Ìý$105
RAC1 2003 Gloveboxed SEM with NPGS Inert-Jeol-EBSEM-R1 Ìý$40 Ìý$120
RAC1 2003 Gloveboxed 2D assembly microscope Inert-Olympus-2DAScope-R1 Ìý$20 Ìý$60
RAC1 2003 Gloveboxed Reactive Ion Etch Inert-PLASMAETCH-RIE-R1 Ìý$20 Ìý$60
RAC1 2003 Gloveboxed chem processing w/ spin coat Inert-PrepFab-Station-R1 Ìý$30 Ìý$90
RAC1 2003 Gloveboxed Atomic Force Microscopy Inert-VEECO-AFM-R1 Ìý$35 Ìý$105
RAC1 2003 Inert lab solvents fumehood Inert-WB-Solvents-R1 Ìý$15 Ìý$45
RAC1 2003 Inert lab acid/Base fumehood Inert-WB-Acidbase-R1 Ìý$15 Ìý$45
RAC2 2021 UHV Sputter and E-beam deposition AJA-Sputter-EBeam-R2 Ìý$40 Ìý$120
RAC2 2021 LPCVD carbon nanotubes ANGSTROM-LPCVD-R2 Ìý$40 Ìý$120
RAC2 2021 LPCVD Silicon nanowires 1stNANO-SiNW-R2 Ìý$45 Ìý$135
RAC2 2031 Pulsed Laser Deposition system TSST-PLD-R2 Ìý$40 Ìý$120
RAC1 1013 Automated Glass Processing Station VYTRAN-splicer-R2 Ìý$20 Ìý$60
RAC2 2112 X-ray diffraction D8-VENTURE-XRD-R2 Ìý$40 Ìý$120
RAC2 1124 Cryogenic Scanning Tunneling Microscope OMICRON-LT-SPM-R2 Ìý$50 Ìý$150

Inventory items (fees listed in NEMO)

  • AFM probes:
    • ScanAsyst-Air
  • Containers:
    • 125 x 65 mm PYREX crystallisation dish
    • 1" wafer holder
    • 2" wafer holder
    • 3" wafer holder
    • 4" wafer holder
    • 4" wafer holder (black polypropylene)
    • 6" wafer holder
    • 400ml pyrex beakers
    • Acid kit
    • Additional cleanroom notebook
    • Beaker box
    • Beaker kit
    • 1" x 1" Gel-box (black conductive)
    • 100 mm glass petri dish
    • large polystyrene petri dish
    • small polystyrene petri dish
    • small polystyrene petri dish - sectioned
    • Nalgene bottle (250 ml)
    • Nalgene bottle (500 ml)
    • Nalgene bottle (1ÌýL)
    • Nalgene bottle (2 L)
    • 10 ml glass photoresist syringe
    • Tweezer box
    • PTFE chip carrier (for chemical processing)
  • Lapping supplies
    • Diamond lapping films
    • Red cloth disk
  • Evaporation and sputter precious metals
    • Ag pellets
    • Au pellets
    • Pd pellets
    • Pt pellets
    • Au sputter target (sold by depositionÌýtime)
    • Pt sputter target (sold by deposition time)
  • Metrology supplies
    • Compact TEM grid box
    • Reverse tweezers (fine)
    • Sample membrane box
    • TEM grids
  • Resist
    • ZEP520A Electron beam resist
  • Service charge
    • Shipping and handling of samples
  • Cleanroom tools
    • 2A PEEK replacement tweezer tips
    • PEEK rounded tip tweezers
    • 4" wafer tweezers (ESD safe)
    • 4" wafer tweezer replacement tips
  • Wafers
    • 3" prime CZ <100> Silicon
    • 4" prime CZ <100> Silicon
    • 6" prime CZ <100> Silicon
    • 100mm borofloat 33 glass DSP wafer