Vendor:Ìý
Model:ÌýCustom
Purpose:ÌýDevelopment of E-beam resists
Equipment description:
This wetbench is dedicated to the development of E-beam resists using solvent and mild-base developers. For more information about available processes and disallowed processes, please consult the equipment wiki page.
System feature and options:
- Deionized (DI) water and nitrogen spray guns
- Drying rack
- Peltier cold plate for cold development
- Cupsink
Wetbench for development of e-beam resists
