Gloveboxed Reactive Ion Etch [Inert-PLASMAETCH-RIE-R1]

Vendor:   
Model:     
Purpose:  Plasma cleaning of substrates

Equipment description:

System features:

  • Glovebox interface
  • 300W 13.56 MHz power supply
  • Available gases
    • Ar
    • O2
    • CHF3

Reactive Ion Etcher