Second PVD seminar delves into the details
On April 1st, the Quantum-Nano Fabrication and Characterization Facility () and Transformative Quantum Technologies () hosted the Physical Vapour Deposition (PVD) Introductory Seminar:  Part 2, joined by speaker  (Angstrom Engineering).
The seminar saw over 40 attendees, including students, postdoctoral fellows and staff. During the event, Miller elaborated on topics covered in the PVD Introductory Seminar such as film characterization methods, testing and analytical techniques, as well as process control.
Topics such as effects of film growth parameters on film properties generated engagement from attendees, contributing to further discussions about surface preparation, process control, and integration of ion-assisted deposition.
Thank you to our presenters, attendees, and organizers.
