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Professor Cui focuses his research on micro-nanofabrication using cleanroom facilities including electron beam lithography, focused ion beam, ICP-RIE/deep RIE, laser direct writing (maskless lithography), and physical/chemical vapor deposition. His group has extensive collaboration with industries in the field like biomedical devices/sensors and terahertz spectroscopy.

Electron beam lithography

Electron beam lithography is the most popular nanolithography techniques for R&D. It utilizes a focused electron beam to expose a resist material and can obtain readily sub-10nm resolution. One challenge in nanofabrication is to pattern on non-flat surfaces, which is desired in many fields such as MEMS, bio-sensors, electronic devices, and optical devices. This is because the usual film coating method spin-coating can form a uniform film only on flat surfaces. My group has developed two methods to enable nanofabrication on irregular surfaces using electron beam lithography. The first one utilizes polystyrene negative resist that can be coated by thermal evaporation on any surfaces. The second method employs a monolayer polymer brush resist that can be formed on any surface with extremely uniform film thickness.

MEMS/Microneedle fabrication

Compared to the conventional hypodermic needle, microneedle array causes negligible pain since it enters a limited depth (~500 mm) without triggering nerve endings located deeper in the skin. It can be used for drug delivery or body fluid interrogation for point-of-care testing. In collaboration with a local startup company working on allergy test, we successfully developed the microfabrication process of hollow silicon microneedles with a cone shape and diameter at apex <5 mm, using deep Si etching, lithography, and needle sharpening by wet etching. We also developed a fabrication process to create Si “in-plane” microneedles that can reach mm-scale length.

AFM probe fabrication

AFM (atomic force microscope) is widely used for topographical structure characterization with ~1nm imaging resolution. It employs a probe tip to scan/feel the specimen surface. One serious issue with AFM imaging is the intrinsic artifact in the AFM image when mapping a non-flat surface where the tip cannot fully follow the sample surface. The natural solution to this issue is by using thin and high aspect ratio tips that can follow the sample surface more precisely. My group has developed a high throughput and low cost process for the fabrication of such high end tips and this technology is being commercialized.

Terahertz spectroscopy

Terahertz (THz) electromagnetic waves have frequencies of order 10^12 Hz and wavelengths order 100 um. Many materials including organic materials, explosives, pharmaceutical compounds and biological agents have distinct signatures in the terahertz frequencies, thus THz spectroscopy. This distinct characteristics of terahertz radiation, along with recent advances in the enabling technologies, have created the opportunity for the terahertz technology to provide unique solutions to many critical industrial problems. At the heart of the THz spectroscope is the THz antenna (transmitter and receiver). In collaboration with a local company, my group has successfully developed the fabrication process for photoconductive antenna with various device configurations (lateral device, mesa structure, vertical device). The THz chip we fabricated has been successfully integrated into the company’s product.

Recent publications include:

• Aydinoglu F, Con C, and Cui B, “Ultra high aspect ratio silicon pores/trenches by photo-assisted electrochemical etching”, J. Vac. Sci. Technol. B, submitted
• Con C, Aydinoglu A, and Cui B, “Ultra high resolution nanofabrication using self-assembly of metal salt-polymer nanocomposite film”, Vac. Sci. Technol. B, submitted.
• Viscomi FN, Dey RK, Caputo R, and Cui B, “Enhanced adhesion of electron beam resist by grafted monolayer PMMA brush”, Vac. Sci. Technol. B, submitted.
• Zhang J, Cao K, Wang X, and Cui B, “Metal-carbonyl organometallic polymers, PFpP, for high-resolution positive and negative electron beam lithography resist”, Chemical Communications, submitted.
• Irannejad M, Cui B and Yavuz M, “The effects of varying dielectric spacer height on the reflection resonance spectrum of gold nanorod-on-mirror grating structure”, Plasmonics, 10, 901-909 (2015).
• Irannejad M, Cui B, and Yavuz M, “Optical properties and liquid sensitivity of Au-SiO₂-Au nanobelt structure”, Plasmonics, 2015. 
• Zhang J, Irannejad M and Cui B, “Bowtie nanoantenna with single-digit nanometer gap for surface-enhanced Raman scattering (SERS)”, Plasmonics, 10, 831-837 (2015.) 
• Dai M, Wan W, Zhu X, Song B, Liu X, Lu M, Cui B, and Chen Y, “Broadband and wide angle infrared wire-grid polarizer”, Optics Express, 23, 15390-97 (2015). 
• Zhang J, Irannejad M, Yavuz M and Cui B, “Gold nanohole array with sub-1 nm roughness by annealing for sensitivity enhancement of extraordinary optical transmission biosensor”, Nanoscale Research Letters, 10, 238 (2015). 
• Sun X, Radovanovic PV, and Cui B, “Advances in spinel Li4Ti5O12 anode materials for lithium-ion batteries”, New Journal of Chemistry, 39, 38-63 (2015). (review article) 
• Sun X, Zhang Y, Gu L, Hu L, Feng K, Chen Z and Cui B, “Nanocomposite of TiO₂ nanoparticles-reduced graphene oxide with high-rate performance for Li-ion battery”, ECS Transactions, 64, 11-17 (2015).
• Zhang J, Con C and Cui B, “Electron beam lithography on irregular surfaces with evaporated resist”, ACS Nano, 8, 3483–3489 (2014).
• Dey RK and Cui B, “Electron beam lithography with in-situ feedback using self-developing resist”, Nanoscale Research Letters, 9, 184 (2014). 
• Irannejad M, Zhang J, Yavuz M and Cui B, “Numerical study of optical behavior of nano-hole array with non-vertical sidewall profile”, Plasmonics, 9, 537–544 (2014). 
• Con C, Zhang J and Cui B, “Nanofabrication of high aspect ratio structures using evaporated resist containing metal”, Nanotechnology, 25, 175301 (2014). 
• Alhazmi M, Aydinoglu F, Cui B, Ramahi OM, Irannejad M, Brzezinski A, and Yavuz M, “Comparison of the Effects of Varying of Metal Electrode in Metal-insulator-metal Diodes with Multi-Dielectric Layers”, Austin Journal of Nanomedicine & Nanotechnology, 2(2), 4 (2014). 
• Aydinoglu F, Alhazmi M, Cui B, Ramahi OM, Irannejad M, Brzezinski A, and Yavuz M, “Higher Performance Metal-Insulator-Metal Diodes using Multiple Insulator Layers”, Austin Journal of Nanomedicine & Nanotechnology, 1(1), 3 (2014). 
• Yavuz M, Irannejad M, Alici K, Rahman EA, Brzezinski A, and Cui B, “Graphene based nano electromechanical interconnects to enable ultrafast electronics”, Austin Journal of Nanomedicine & Nanotechnology, 2, 1033 (2014).
• Abbas AS, Alqarni S, Shokouhi BB, Yavuz M, and Cui B, “Water soluble and metal-containing electron beam resist poly(sodium 4-styrenesulfonate)”, Mater. Res. Express, 1, 045102 (2014). 
• Saffih F, Con C, Alshammari A, Yavuz M, and Cui B, “Fabrication of silicon nanostructures with large taper angle by reactive ion etching”, J. Vac. Sci. Technol. B, 32, 06FI04 (2014). 
• Dey RK and Cui B, “Lift-off with solvent for negative resist using low energy electron beam exposure”, J. Vac. Sci. Technol. B, 32, 06F507 (2014). 
• Wan W, Lin L, Xu Y, Guo X, Liu X, Ge H, Lu M, Cui B, and Chen Y, “Planar self-aligned imprint lithography for coplanar plasmonic nanostructures fabrication”, Applied Physics A, 116, 657–662 (2014). 
• un X, Hegde M, Wang J, Zhang Y, Liao JY, Radovanovic PV, and Cui B, “Structural Analysis and Electrochemical Studies of Carbon Coated Li4Ti5O12 Particles Used as Anode for Lithium Ion Battery”, ECS Transactions, 58, 79-88 (2014). 
• Sun X, Wang YQ, Hegde M, Shu J, Bai XD, Zhang YF, Radovanovic PV, and Cui B “Structure and Electrochemical Properties of Spinel Li4Ti5O12 Nanocomposites as Anode for  Lithium-Ion Battery”, International Journal Electrochemical Science, 9, 1583-1596 (2014). 
• Abbas AS, Yavuz M and Cui B, “Polycarbonate electron beam resist using solvent developer”, Microelectron. Eng., 113, 140-142 (2014). 
• Bai X, Wen D, Con C, Zhang J, Yavuz M and Cui B, “Research on Fabrication and Electronic Characteristics of Dual-Extended Nano Structure Memristor”, Key Engineering Materials, 609-610, 728-733 (2014).
• Dey RK and Cui B, “Stitching error reduction in electron beam lithography with in-situ feedback using self-developing resist”, J. Vac. Sci. Technol. B, 31 (6), 06F409 (2013).
• Irannejad M, Yavuz M and Cui B, “Finite difference time domain study of light transmission through multihole nanostructures in metallic film”, Photonics Research, 1(4), 154-159 (2013).
• Sun X, Sun K, Wang Y, Bai X and Cui B, “Scale-up synthesis, structure characterization and electrochemical characteristics of C-LiFePO4 nanocomposites for lithium ion rechargeable batteries”, Int. J. Electrochem. Sci., 8, 12816-12836 (2013).
• Con C, Abbas AS, Yavuz M and Cui B, “Dry Thermal Development of Negative Electron Beam Resist Polystyrene”, Advances in Nano Research, 1, 105-109 (2013).
• Con C and Cui B, “Effect of mold treatment by solvent on PDMS molding into nanoholes”, Nanoscale Research Letters, 8, 394 (2013).
• Irannejad M and Cui B, “Effects of refractive index variations on the optical transmittance spectral properties of the nano-hole arrays”, Plasmonics, 8, 1245-1251 (2013).
• Chen JY, Con C, Yu MH, Cui B and Sun KW, “Efficiency enhancement of PEDOT:PSS/Si hybrid solar cells by using nanostructured radial junction and antireflective surface”, ACS Appl. Mater. Interfaces, 5 (15), 7552–7558 (2013).
• Liu R, Zhang F, Con C, Cui B and Sun B, “Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching”, Nanoscale Research Letters, 8, 155 (2013).
• Dey RK, Cui B, “Effect of molecular weight distribution on e-beam exposure properties of polystyrene”, Nanotechnology, 24, 245302 (2013).
• Sun X, Sun K, Chen C, Sun H and Cui B, “Controlled Preparation and Surface Structure Characterization of Carbon-Coated Lithium Iron Phosphate and Electrochemical Studies as Cathode Materials for Lithium Ion Battery”, International Journal of Materials and Chemistry, 2(5), 218-224 (2012).
• Zhang J, Shokouhi B and Cui B, “Tilted nanostructure fabrication by electron beam lithography”, J. Vac. Sci. Technol. B, 30(6), 06F302(2012).
• Liu W, Ferguson M, Yavuz M and Cui B, “Porous TEM windows fabrication using CsCl self-assembly”, J. Vac. Sci. Technol. B, 30(6), 06F201(2012).
• Xuan Y, Guo X, Cui Y, Yuan C, Ge H, Cui B and Chen Y, “Crack-free controlled wrinkling of a bilayer film with a gradient interface”, Soft Matter, 8, 9603-9609(2012).
• Con C, Dey R, Ferguson M, Zhang J, Mansour R, Yavuz M and Cui B, “High molecular weight polystyrene as very sensitive electron beam resist”, Microelectronic Engineering, 98, 254-257(2012).
• Con C, Zhang J, Jahed Z, Tsui TY, Yavuz M and Cui B, “Thermal nanoimprint lithography using fluoropolymer mold”, Microelectronic Engineering, 98, 246-249(2012).
• Shokouhi B, Zhang J and Cui B, “Very high sensitivity ZEP resist using MEK:MIBK developer”, Micro & Nano Lett. 6(12), 992–994 (2011).
• Ma S, Con C, Yavuz M and Cui B, “Polystyrene Negative Resist for High Resolution Electron Beam Lithography”, Nanoscale Research Letters, 6, 446 (2011).
• Zhang J, Fouad M, Yavuz M and Cui B, “Fabrication of dense periodic 2D nanostructures by electron beam lithography with reduced charging effect”, Microelectronic Engineering, 88(8), 2196-2199 (2011)
• Zhang J, Cui B and Ge H, “Fabrication of flexible mold for hybrid nanoimprint-soft lithography”, Microelectronic Engineering, 88(8), 2192-2195 (2011).
• Fouad M, Yavuz M and Cui B, “Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing”, J. Vac. Sci. Technol. B, 28, C6111 (2010).
• Cui B, Clime L and Veres T, “Fabrication of nanostar array by nanoimprint lithography”, J. Vac. Sci. Technol. B 28, C6026 (2010).
• Rahman SMS and Cui B, “Mold Fabrication for 3D Dual Damascene Imprinting”, Nanoscale Research Letters, 5, 545–549 (2010).
• Cui B, Keimel C and Chou SY, “Ultrafast Direct Imprint of Nanostructures in Metals by Pulsed Laser Melting”, Nanotechnol. 21, 045303 (2010).
• Malic L, Cui B, Veres T and Tabrizian M, “Nanoimprinted plastic substrates for enhanced surface plasmon resonance imaging detection”, Optics Express, 17(22), 20386-92 (2009).
• Geissler M, Li K, Cui B, Clime L and Veres T, “Plastic substrates for surface-enhanced Raman scattering”, J. Phys. Chem. C, 113(40), 17296–17300 (2009).
• Li Z, Gu Y, Wang L, Ge H, Wu W, Xia Q, Yuan C, Chen Y, Cui B and Williams RS “Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution”, Nano Lett., 9 (6), 2306–2310 (2009).
• Heidi Au HT, Cui B, Chu ZE, Veres T and Radisic M, “Cell culture chips for simultaneous application of topographical and electrical cues enhance phenotype of cardiomyocytes”, Lab Chip, 9, 564–575 (2009).
• Guillemette MD, Cui B, Roy E, Gauvin R, Giasson CJ, Esch MB, Carrier P, Deschambeault A, Dumoulin M, Toner M, Germain L, Veres T and Auger FA, “Surface topography induces 3D self-orientation of cells and extracellular matrix resulting in improved tissue function”, Integrated Biology, 1, 196–204 (2009).
• Hajiaboli A, Cui B, Kahrizi M and Truong VV, “Optical properties of thick metal nanohole arrays fabricated by electron beam and nanosphere lithography”, Physica Status Solidi AApplications and Materials Science, 206(5), 976-979 (2009).
• Cui B, Wu L and Chou SY, “Fabrication of high aspect ratio metal nano-tips by nanosecond pulse laser melting”, Nanotechnol. 19, 345303 (2008).
• Li K, Clime L, Tay L, Cui B, Geissler M and Veres T, “Multiple Surface Plasmon Resonances and Near-Infrared Field Enhancement of Gold Nanowells”, Analytical Chemistry, 80(13), 4945-4950 (2008).
• Cui B and Veres T, “High resolution electron beam lithography of PMGI using solvent developer”, Microelectron. Eng. 85, 810-813 (2008).
• Cui B, Clime L, Li K and Veres T, “Fabrication of large area nanoprism array and its application for surface enhanced Raman spectroscopy (SERS)”, Nanotechnol. 14, 145302 (2008).
• Li K, Clime L, Cui B and Veres T, “Surface Enhanced Raman Scattering on Long-range Ordered Noble-metal Nanocrescent Arrays”, Nanotechnol. 14, 145305 (2008).
• Malic L, Cui B, Veres T and Tabrizian M, “Enhanced surface plasmon resonance imaging detection of DNA hybridization on periodic gold nanoposts”, Opt. Lett. 32, 3092 (2007).
• Alvarez-Puebla R, Bravo-Vasquez JP, Cui B, Veres T and Fenniri H, “ SERS Classification of Highly Related Performance Enhancers”, ChemMedChem, 2(8), 1165-1167 (2007).
• Cui B and Veres T, “Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching”, Microelectron. Eng., 84 , 1544–47 (2007). 19. Alvarez-Puebla R, Cui B, Bravo-Vasquez JP, Veres T and Fenniri H, “Nanoimprinted SERS-active substrates with tunable surface plasmon resonances”, J. Phys. Chem. C, 111, 6720-23 (2007).
• Cui B, Yu ZN, Ge, HX and Chou SY, “Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling”, Appl. Phys. Lett., 90, 043118 (2007).
• Le Drogoff B, Cui B and Veres T, “Fast 3D Nanostructure Fabrication by Laser-Assisted nano-Transfer Printing”, Appl. Phys. Lett., 89, 113103 (2006).
• Cui B and Veres T, “Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography”, Microelectron. Eng., 83, 902-905 (2006).
• Cui B and Veres T, “Polyimide nanostructures fabricated by nanoimprint lithography and its application as flexible imprint mould”, Microelectron. Eng., 83, 906-909 (2006).
• Cui B, Wu W, Keimel C and Chou SY, “Filling of Via Holes by Laser-Assisted Direct Imprint (LADI)”, Microelectron. Eng., 83 (4-9), 1547-1550 (2006).
• Beauvais J, Lavallee E, Zanzal A, Drouin D, Lau KM, Veres T and Cui B, “Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist”, Proceedings of SPIE, 5751, 392-399 (2005).
• Feng J, Cui B, Zhan Y, and Chou SY, “Flexible metal film with micro- and nanopatterns transferred by electrochemical deposition”, Electrochem. Commun., 4, 102-104 (2002).
• Kong L, Pan Q, Cui B, Li M, and Chou SY, “Magneto-transport and domain structures in nano-scale NiFe/Cu/Co spin valve”, J. Appl. Phys.  85 (8): 5492-5494 (1999).
• Cui B, Wu W, Kong LS, Sun XY, Chou SY, “Perpendicular quantized Magnetic disks with 45 Gbits on a 4×4 cm 2 area”, J. Appl. Phys.  85 (8): 5534-5536 (1999).
• Chou SY, Kong LS, Wu W, Cui B, “Fabrication, reading and writing of quantized magnetic disks with 65 Gbit/in(2) perpendicular storage density and 30 Gbit/in 2 longitudinal storage density”, Electrochemical Society Series, 98(20), 253-254 (1999).
• Kong L, Zhuang L, Li M, Cui B, Chou SY, “Fabrication, writing, and reading of 10 Gbits/in(2) longitudinal quantized magnetic disks with a switching field over 1000 Oe”, Jpn. J. Appl. Phys. Part 1, 37 (11): 5973-5975 (1998).
• Wu W, Cui B, Sun XY, Zhang W, Zhuang L, Kong LS, Chou SY, “Large area high density quantized magnetic disks fabricated using nanoimprint lithography”, J. Vac. Sci. Technol. B 16 (6): 3825-3829 (1998).
• Mao W, Yang J, Cui B, Cheng B, Yang Y, Du H, Zhang B, Ye C, and Yang J, “A study on the effect of hydrogen in the compounds with ThMn12-type structure”, J. Phys. – Condensed Matter, 10 (12): 2611-2616 (1998).
• Yang J, Cui B, Mao W, Yang Y, Chen D, Yang Y, and Gou C, “A linear muffin-tin orbital calculation of local electronic and magnetic properties of YFe10Mo2 and YFe10Mo2N”, J. Phys. Soc. Jpn., 67 (2): 576-582 (1998).
• Yang J, Cui B, Mao W, Cheng B, Yang Y, Ge S, “Hard magnetic properties of NdFe10.5V1.5Nx powders with high performance”, J. Magn. Magn. Mater. 182, 131-136 (1998).35. Yang J, Cui B, Mao W, Cheng B, Yang J, Hu B, Yang Y, Ge S, “Effect of interstitial nitrogen on the structural and magnetic properties of NdFe10.5V1.5Nx”, J. Appl. Phys., 83 (5): 2700-2704 (1998).
• Yang J, Cui B, Cheng B, Mao W, Yang Y, Ge S, “Preparation of NdFe10.5V1.5Nx powders with potential as high-performance permanent magnets”, J. Phys D: Appl. Phys., 31 (3): 282-286 (1998).
• Yang J, Cui B, Mao W, Pei X, Yang Y, “Theoretical calculation on the magnetocrystalline anisotropy of NdFe10.5V1.5Nx”, Solid State Commun., 104 (10): 615-618 (1997).

Book edited and book chapter

• Bo Cui (Editor), Lithography (Vol. I & II), Intech, in progress.

• Li K, Morton K, Veres T and Cui B (corresponding author), “Nanoimprint Lithography and its Application in Tissue Engineering and Bio-sensing”, Comprehensive Biotechnology, 2nd edition, Elsevier, to appear in 2011.

Conference presentations

• Zhang Z and Cui B, “Fabrication of dense periodic 2D nanostructures by electron beam lithography with reduced charging effect”, 36th International Conference on Micro- and Nano-Engineering, Genoa, Italy, September 2010.
• Zhang Z and Cui B, “Fabrication of flexible mold for hybrid nanoimprint-soft lithography”, 36th International Conference on Micro- and Nano-Engineering, Genoa, Italy, September 2010. Fouad M, Yavuz M and Cui B, “Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing”, 54th International Conference on Electron, Ion and Photon Beam Technology and Nano-fabrication (EIPBN), Anchorage, Alaska, June 2010.
• Cui B, Clime L and Veres T, “Fabrication of nanostar array by nanoimprint lithography”, 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), Anchorage, Alaska, June 2010.
• Morton K, Cui B, Malic L and Veres T, “Ultrasmooth, 3D Nanostructured Gold Films for Enhanced SPR detection by Nanoimprint Lithography and Template Stripping”, 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), Anchorage, Alaska, June 2010.
• Fouad M, Yavuz M and Cui B, “Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing”, NanoOntario, London, Canada, April, 2010.
• Cui B, Clime L and Veres T, “Fabrication of nanostar array by nanoimprint lithography”, NanoOntario, London, Canada, April, 2010.
• Rahman SMS and Cui B, “Mold Fabrication for 3D Dual Damascene Imprinting”, Nano and Giga Challenges in Electronics, Photonics and Renewable Energy, Hamilton, Canada, August 2009.
• Malic L, Cui B, Veres T and Tabrizian M, “Periodic gold nanopost-based biochips for enhanced surface plasmon resonance imaging detection of DNA hybridization,” NanoQuebec Inno2008, Montreal, Canada, 2008. 10.
• Hajiaboli A, Fida F, Cui B, Djaoued Y, Balaji S, Badilescu S, Kahrizi M, Truong VV, “Optical Properties of Thick Metal Nanohole Arrays Fabricated by Electron Beam – and Nanosphere Lithography”, ICOOPMA, Edmonton, Canada, 2008.
• Malic L, Cui B, Veres T and Tabrizian M, “Nanostructure enhanced surface plasmon resonance imaging detection of DNA hybridization”, Proceedings of MicroTAS 2007, Paris, France , pp. 442-444, (2007).
• Malic L, Cui B, Veres T and Tabrizian M, “Nanostructure and E-field enhanced SPR imaging detection of DNA hybridization,” Colloque Nano 2007, Montreal, Canada (2007).
• Li K, Cui B, Clime L, Geissler M and Veres T, “Fabrication of discreet nano arrays by using nanoimprint lithography and their surface-enhanced Raman scattering effect”, MRS fall meeting, Boston, November 2007.
• Cui B, Zhao S and Veres T, “High resolution electron beam lithography of PMGI using solvent developer”, Micro- and Nano-Engineering, Copenhagen, September 2007.
• Cui B, Li K, Clime L and Veres T, “Fabrication of nanoprisms by nanoimprint lithography”, Micro- and Nano-Engineering, Copenhagen, September 2007.
• Malic L, Tabrizian M, Cui B and Teodor Veres, “Nanostructure and e-field enhanced surface plasmon resonance imaging detection of DNA hybridization”, Colloque NanoQuebec, Montreal, February 2007.
• Cui B and Veres T, “Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching”, Micro- and Nano-Engineering, Barcelona, September 2006.
• Guillemette MD, Cui B, Deschambeault A, Germain L, Veres T and Auger FA, “Behaviour study of corneal fibroblasts on nanostructured and microstructured polystyrene”, NanoForum, Edmonton, Canada, 2006.
• Le Drogoff B, Cui B, and Veres T, “Laser-Assisted nano-Transfer Printing: Application to fast 3D imprint mold fabrication”, Nanoimprint and Nanoimprint Technology (NNT), Kyoto Japan, October 2005.
• Cui B and Veres T, “Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography”, Micro- and Nano-Engineering, Vienna, September 2005.
• Cui B and Veres T, “Polyimide nanostructures fabricated by nanoimprint lithography and its application as flexible imprint mould”, Micro- and Nano-Engineering, Vienna, September 2005.
• Cui B, Wu W, Keimel C and Chou SY, “Filling of Via Holes by Laser-Assisted Direct Imprint (LADI)”, Micro- and Nano-Engineering, Vienna, September 2005.
• Chou SY, Keimel C and Cui B, “Wafer Planarization by Laser Assisted Direct Imprint (PLADI)”, Micro- and Nano-Engineering, Vienna, September 2005.
• Cui B, Chiu P, Yang HJ, Veres T, Shih I and Xiao S, “Nano-structured plastic solar cell fabricated by Direct Nanoimprint of Semiconducting Polymer”, Thirdd International Conference on Nanoimprint and Nanoprint Technology, December 2004.
• Beauvais J, Mun LK, Drouin D, Lavallee E, Veres T and Cui B, “Three dimensional imprinting template produced using evaporated e-beam resist and reactive ion etching”, Third International Conference on Nanoimprint and Nanoprint Technology, December 2004. 26. Cui B, Keimel C, Yu Z, Wu W, and Chou SY, “Ultrafast planarization of 200 nm period copper grating by pulsed laser”, Second International Conference on Nanoimprint and Nanoprint Technology, December 2003.
• Lei X, Cui B, Ge H, and Chou SY, “Fabrication of subwavelength surface plasmon mirrors by nanoimprint lithography”, Second International Conference on Nanoimprint and Nanoprint Technology, December 2003.
• Cui B, Kong L, Wu W, and Chou SY, “Fabrication of magnetic nanostructures, quantized magnetic disks, and spin-valve devices by nanoimprint lithography”, First International Conference on Nanoimprint and Nanoprint Technology, December 2002.
• Cui B, Yu Z, Wu W, Ge H, and Chou SY, “Grating frequency doubling using nanoimprint lithography and electroless plating for large area 50 nm period grating fabrication”, the 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, June 2002.
• Cui B, Kong L, Guo L, and Chou SY, “Spintronics and their fabrication by nanoimprint”, Spins in Semiconductors (SPINS) Workshop, January 2000.
• Chou SY, Kong L, Cui B, and Wu W, “Patterned magnetic nanostructure and quantized magnetic disks”, American Physical Society Centennial.
• Cui B, Wu W, Sun X, and Chou SY, “Large area quantized magnetic disks (QMDs) fabricated by using nanoimprint lithography and electroplating”, The 43rd Annual Conference on Magnetism and Magnetic Materials, November 1998.
• Wu W, Cui B, Sun X, Zhang W, Zhuang L, Kong L, and Chou SY, “High density quantized magnetic disks fabricated using nanoimprint lithography”. the 42th International Conference on Electron, Ion and Photon Beam Technology and Nano-fabrication, June 1998.
• Kong L, Pan Q, Li M, Cui B and Stephen Y. Chou, “A new spin-valve magnetic memory cell based on patterned single-domain magnetic multilayer”, The 56th Annual Device Research Conference, June 1998.

Patents

• Chou SY, Cui B and Keimel CF, “Method for filling of nanoscale holes and trenches and for planarizing of a wafer surface”, US2007082457.
• Malic L, Veres T, Cui B, Normandin F and Tabrizian M, “System and method for surface plasmon resonance based detection of molecules”, WO2008101348-A1, submitted in 2008.