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DTSTART;TZID=America/Toronto:20190715T153000
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URL:/institute-nanotechnology/events/win-and-electrical
 -and-computer-engineering-joint-high
SUMMARY:WIN and Electrical and Computer Engineering Joint: High Aspect Rati
 o\nPolymer and Metal Patterning at the Synchrotron Laboratory for Micro\na
 nd Nano Devices (SyLMAND)\, Canadian Light Source
CLASS:PUBLIC
DESCRIPTION:Summary \n\nPlease join the À¶Ý®ÊÓƵ Institute for Nanotechnolo
 gy and the\nDepartment of Electrical and Computer Engineering on Monday\, 
 July 15\,\n2019 for a guest lecture by Dr. Sven Achenbach from the Unive
 rsity\nof Saskatchewan. He will be speaking on \"HIGH ASPECT RATIO POLYMER
  AND\nMETAL PATTERNING AT THE SYNCHROTRON LABORATORY FOR MICRO AND NANO\nD
 EVICES (SYLMAND)\, CANADIAN LIGHT SOURCE\". [Poster]\n[/institute-nanotec
 hnology/sites/ca.institute-nanotechnology/files/uploads/files/sven_achenba
 ch_-_seminar_-_notice.pdf]\n\nABSTRACT:\n 
DTSTAMP:20250708T082325Z
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